| Course Unit Code | 9360-0158/01 |
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| Number of ECTS Credits Allocated | 4 ECTS credits |
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| Type of Course Unit * | Compulsory |
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| Level of Course Unit * | Second Cycle |
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| Year of Study * | Second Year |
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| Semester when the Course Unit is delivered | Winter Semester |
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| Mode of Delivery | Face-to-face |
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| Language of Instruction | Czech |
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| Prerequisites and Co-Requisites | Course succeeds to compulsory courses of previous semester |
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| Name of Lecturer(s) | Personal ID | Name |
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| POS40 | doc. Dr. Mgr. Kamil Postava |
| HAL29 | Ing. Lukáš Halagačka, Ph.D. |
| Summary |
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| The course explains the principles of advanced technologies for the preparation of thin films, coatings, nanostructures, integrated circuits and optoelectronics. It includes methods for gas, liquid and solid phase deposition, both at atmospheric pressure and in vacuum, with or without the use of plasma, laser radiation, ion etching, electron gun, resistive evaporation sources, sputtering, or etching. It focuses primarily on explaining the physical principles of these processes and the corresponding technological and analytical devices and components (eg. electron, ion and neutral beam sources). At the same time it explains the most used methods for characterization of prepared materials with main emphasis on in-situ methods. |
| Learning Outcomes of the Course Unit |
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Classify and identify the progressive technologies in nanostructures.
Formulate the fundamentals of preparation and diagnostics of nanostructures.
Evaluate the advantages and disadvantages of discussed approaches.
Predict the new trends in applications.
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| Course Contents |
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1. Introduction to preparation technologies, their scope and use in research and industry.
2. The principles of layer growth. Interaction of particles with solid materials (electrons, ions, neutral particles).
3. Used sources of electrons, ions, atoms, molecules, plasma, photons and their parameters. Elements for their manipulation and measurement.
4. Physical methods for the preparation of nanostructures (evaporation, DC, RF, reactive, magnetron and ion sputtering, pulsed laser deposition, evaporation with additional ion beam).
5. Chemical and combined methods of preparation (types of reactions used, thermal and organometal CVD processes, plasma and laser enhanced CVD, processes thermodynamics, gas transfer in deposition chambers, layer growth kinetics).
6. Lithographic processes, two-photon polymerization, alloying (ion implantation) and plasma etching.
7. Nucleation on substrate (capillary theory and atomic models). Layer growth modes. Reconstruction, material and electron structure of surfaces. Defects in monocrystalline growth. Methods for epitaxy (MBE, LPE, LEGO, MOVPE, ALE).
8. Analysis of surfaces, thin layers and nanostructures - Overview of in-situ and ex-situ methods. Usecases of individual methods (STM, AFM, TEM, SEM AES, RBS, ISS, SIMS, XPS, LEED, RHEED, etc.).
9. New trends in advanced methods for material preparations. |
| Recommended or Required Reading |
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| Required Reading: |
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OHRING, M.: Materials Science of Thin Films. 2nd ed. San Diego: Academic Press, 2002, 794 s. ISBN 0125249756.
OURA, K., LIFSHITS, V.G., SARANIN, A., ZOTOV, A.V., KATAYAMA, M.: Surface Science: An Introduction. New York: Springer, 2003, 440 s. ISBN 3540005455.
KITTEL, C.: Introduction to Solid State Physics. 8th ed. Hoboken, NJ: Wiley, c2005. ISBN 047141526x. |
OHRING, M.: Materials Science of Thin Films. 2nd ed. San Diego: Academic Press, 2002, 794 s. ISBN 0125249756.
OURA, K., LIFSHITS, V.G., SARANIN, A., ZOTOV, A.V., KATAYAMA, M.: Surface Science: An Introduction. New York: Springer, 2003, 440 s. ISBN 3540005455.
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| Recommended Reading: |
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BRODIE, I., MURAY, J. J.: The Physics of Micro/Nano-Fabrication. Plenum Press, New York, 1992.
VÁLYI, L.: Atom and Ion Sources. John Wiley and Sons Ltd (March 1, 1978).
ECKERTOVÁ, L.: Physics of Thin Films. Plenum Press, New York, 1986.
FELDMAN, L. C., MAYER, J. W.: Fundamentals of Surface and Thin Film Analysis. Elsevier Science Publishing Co., Inc., 1986.
RIVIERE, J. C.: Surface Analytical Techniques. Clarendon Press, Oxford, 1990. |
| KITTEL, C.: Introduction to Solid State Physics. 8th ed. Hoboken, NJ: Wiley, c2005. ISBN 047141526x. |
| Planned learning activities and teaching methods |
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| Lectures |
| Assesment methods and criteria |
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| Task Title | Task Type | Maximum Number of Points
(Act. for Subtasks) | Minimum Number of Points for Task Passing |
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| Credit | Credit | 100 | 51 |