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Practice of Advanced Nanostructure Preparation Technologies I

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Course Unit Code9360-0159/01
Number of ECTS Credits Allocated3 ECTS credits
Type of Course Unit *Compulsory
Level of Course Unit *Second Cycle
Year of Study *Second Year
Semester when the Course Unit is deliveredWinter Semester
Mode of DeliveryFace-to-face
Language of InstructionCzech
Prerequisites and Co-Requisites Course succeeds to compulsory courses of previous semester
Name of Lecturer(s)Personal IDName
POS40doc. Dr. Mgr. Kamil Postava
Summary
The main target of the advanced technology of nanostructure preparation is to obtain practical skills in the field thin film deposition using physical vapor deposition (PVD) and laser lithography. Students will use research laboratory equipment and setups.
Learning Outcomes of the Course Unit
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Course Contents
Laboratory training include preparation of thin films of dielectrics, semiconductors, and metals and master of lithographic processes. It is based on the particular items:
1. Preparation of thin films by physical vapor deposition processes (PVD) – including processes of magnetron sputtering and evaporation, control of vacuum system, and computer control of the processes
2. Lithographic process including preparation of photoresist using spin coating, input and exposition of the structure using laser lithograph, development and finalization of the lithographic process
3. Characterization of the prepared samples using ex-situ methods – ellipsometry, spectroscopy, optical microscopy, atomic force microscopy (AFM), electron microscopy
Recommended or Required Reading
Required Reading:
OHRING, M.: Materials Science of Thin Films. 2nd ed. San Diego: Academic Press, 2002.
BRODIE, I., MURAY, J. J.: The Physics of Micro/Nano-Fabrication. Plenum Press, New York, 1992;
VÁLYI, L.: Atom and Ion Sources. John Wiley and Sons Ltd (March 1, 1978);
MACK, C. A.: Field guide to optical lithography, SPIE Press 2006.
OHRING, M.: Materials Science of Thin Films. 2nd ed. San Diego: Academic Press, 2002.
BRODIE, I., MURAY, J. J.: The Physics of Micro/Nano-Fabrication. Plenum Press, New York, 1992;
VÁLYI, L.: Atom and Ion Sources. John Wiley and Sons Ltd (March 1, 1978);
MACK, C. A.: Field guide to optical lithography, SPIE Press 2006.
Recommended Reading:
LIN, B. J.: Optical Lithography, SPIE Press 2010.
ECKERTOVÁ, L.: Physics of Thin Films. Plenum Press, New York, 1986
FELDMAN, L. C., MAYER, J. W.: Fundamentals of Surface and Thin Film Analysis. Elsevier Science Publishing Co., Inc., 1986
LIN, B. J.: Optical Lithography, SPIE Press 2010.
ECKERTOVÁ, L.: Physics of Thin Films. Plenum Press, New York, 1986
FELDMAN, L. C., MAYER, J. W.: Fundamentals of Surface and Thin Film Analysis. Elsevier Science Publishing Co., Inc., 1986
Planned learning activities and teaching methods
Seminars, Tutorials
Assesment methods and criteria
Task TitleTask TypeMaximum Number of Points
(Act. for Subtasks)
Minimum Number of Points for Task Passing
Graded creditGraded credit100 51