1. Principles of thin film and nanostructure preparation, applications
2. Vacuum systems, top-down and bottom-up preparation of nanostructures3. Thin film preparation by physical vapour deposition, Thorton model
4. Silicon and other substrates
5. Vacuum evaporation
6. Magnetron sputtering (DC/RF)
7. Reactive magnetron sputtering and MBE
9. Chemical Vapour Deposition (CVD) and derived processes
9.Introduction to optical lithography with direct writing
10.Photoresists for lithographic processes
11. Chemical processes in the exposure of photoresist during the writing and developing process
12.Lithography of binary structures
13. Optical and structural characterization of prepared structures of exposed photoresist
2. Vacuum systems, top-down and bottom-up preparation of nanostructures3. Thin film preparation by physical vapour deposition, Thorton model
4. Silicon and other substrates
5. Vacuum evaporation
6. Magnetron sputtering (DC/RF)
7. Reactive magnetron sputtering and MBE
9. Chemical Vapour Deposition (CVD) and derived processes
9.Introduction to optical lithography with direct writing
10.Photoresists for lithographic processes
11. Chemical processes in the exposure of photoresist during the writing and developing process
12.Lithography of binary structures
13. Optical and structural characterization of prepared structures of exposed photoresist