1. Methods for the preparation of thin films and nanostructured materials, conditions for the preparation of materials
2. Vacuum systems, plasma physics and chemical processes
3. Physical vapour deposition (PVD) methods
4. Chemical vapour deposition (CVD) for the preparation of epitaxial and nanostructured materials
5. Chemical vapour deposition in a plasma environment
6. Other derived CVD methods (MOCVD, LPCVD, ALD)
7. In-situ methods for monitoring material growth
8. Substrates and photoresists not only for semiconductor manufacturing, their production and properties
9. Lithography of advanced grayscale structures
10. Lift-off, wet-etching and dry-etching lithography methods
11. AFM, SEM, confocal microscopy characterization
12. MOSFET transistor masking lithography
13. State of the Art semiconductor lithography
2. Vacuum systems, plasma physics and chemical processes
3. Physical vapour deposition (PVD) methods
4. Chemical vapour deposition (CVD) for the preparation of epitaxial and nanostructured materials
5. Chemical vapour deposition in a plasma environment
6. Other derived CVD methods (MOCVD, LPCVD, ALD)
7. In-situ methods for monitoring material growth
8. Substrates and photoresists not only for semiconductor manufacturing, their production and properties
9. Lithography of advanced grayscale structures
10. Lift-off, wet-etching and dry-etching lithography methods
11. AFM, SEM, confocal microscopy characterization
12. MOSFET transistor masking lithography
13. State of the Art semiconductor lithography