1. Methods of preparation of thin films and nanostructured materials, conditions of material preparation
2. Vacuum systems, plasma physics and chemical processes
3. Physical vapour deposition (PVD) methods
4. Chemical vapour deposition (CVD) for the preparation of epitaxial and nanostructured materials
5. Chemical vapour deposition in plasma environment and derived CVD methods (MOCVD, LPCVD, ALD)
6. Layer growth methods, epitaxial growth
7. In-situ monitoring of material growth, optical, X-ray and electron diffraction methods
8. Substrates and photoresists not only for semiconductor manufacturing, their production and properties
9. Lithography of advanced grayscale structures
10. Lift-off, wet-etching and dry-etching lithography methods
11. AFM, SEM, confocal microscopy characterization
12. MOSFET transistor masking lithography
13. State of the Art semiconductor lithography
2. Vacuum systems, plasma physics and chemical processes
3. Physical vapour deposition (PVD) methods
4. Chemical vapour deposition (CVD) for the preparation of epitaxial and nanostructured materials
5. Chemical vapour deposition in plasma environment and derived CVD methods (MOCVD, LPCVD, ALD)
6. Layer growth methods, epitaxial growth
7. In-situ monitoring of material growth, optical, X-ray and electron diffraction methods
8. Substrates and photoresists not only for semiconductor manufacturing, their production and properties
9. Lithography of advanced grayscale structures
10. Lift-off, wet-etching and dry-etching lithography methods
11. AFM, SEM, confocal microscopy characterization
12. MOSFET transistor masking lithography
13. State of the Art semiconductor lithography