1. Introduction to preparation technologies, their scope and use in research and industry.
2. The principles of layer growth. Interaction of particles with solid materials (electrons, ions, neutral particles).
3. Used sources of electrons, ions, atoms, molecules, plasma, photons and their parameters. Elements for their manipulation and measurement.
4. Physical methods for the preparation of nanostructures (evaporation, DC, RF, reactive, magnetron and ion sputtering, pulsed laser deposition, evaporation with additional ion beam).
5. Chemical and combined methods of preparation (types of reactions used, thermal and organometal CVD processes, plasma and laser enhanced CVD, processes thermodynamics, gas transfer in deposition chambers, layer growth kinetics).
6. Lithographic processes, two-photon polymerization, alloying (ion implantation) and plasma etching.
7. Nucleation on substrate (capillary theory and atomic models). Layer growth modes. Reconstruction, material and electron structure of surfaces. Defects in monocrystalline growth. Methods for epitaxy (MBE, LPE, LEGO, MOVPE, ALE).
8. Analysis of surfaces, thin layers and nanostructures - Overview of in-situ and ex-situ methods. Usecases of individual methods (STM, AFM, TEM, SEM AES, RBS, ISS, SIMS, XPS, LEED, RHEED, etc.).
9. New trends in advanced methods for material preparations.
2. The principles of layer growth. Interaction of particles with solid materials (electrons, ions, neutral particles).
3. Used sources of electrons, ions, atoms, molecules, plasma, photons and their parameters. Elements for their manipulation and measurement.
4. Physical methods for the preparation of nanostructures (evaporation, DC, RF, reactive, magnetron and ion sputtering, pulsed laser deposition, evaporation with additional ion beam).
5. Chemical and combined methods of preparation (types of reactions used, thermal and organometal CVD processes, plasma and laser enhanced CVD, processes thermodynamics, gas transfer in deposition chambers, layer growth kinetics).
6. Lithographic processes, two-photon polymerization, alloying (ion implantation) and plasma etching.
7. Nucleation on substrate (capillary theory and atomic models). Layer growth modes. Reconstruction, material and electron structure of surfaces. Defects in monocrystalline growth. Methods for epitaxy (MBE, LPE, LEGO, MOVPE, ALE).
8. Analysis of surfaces, thin layers and nanostructures - Overview of in-situ and ex-situ methods. Usecases of individual methods (STM, AFM, TEM, SEM AES, RBS, ISS, SIMS, XPS, LEED, RHEED, etc.).
9. New trends in advanced methods for material preparations.