Pokročilé technologie přípravy nanostruktur I

The course explains the principles of advanced technologies for the preparation of thin films, coatings, nanostructures, integrated circuits and optoelectronics. It includes methods for gas, liquid and solid phase deposition, both at atmospheric pressure and in vacuum, with or without the use of plasma, laser radiation, ion etching, electron gun, resistive evaporation sources, sputtering, or etching. It focuses primarily on explaining the physical principles of these processes and the corresponding technological and analytical devices and components (eg. electron, ion and neutral beam sources). At the same time it explains the most used methods for characterization of prepared materials with main emphasis on in-situ methods.