OHRING, M.: Materials Science of Thin Films. 2nd ed. San Diego: Academic Press, 2002.
BRODIE, I., MURAY, J. J.: The Physics of Micro/Nano-Fabrication. Plenum Press, New York, 1992;
VÁLYI, L.: Atom and Ion Sources. John Wiley and Sons Ltd (March 1, 1978);
MACK, C. A.: Field guide to optical lithography, SPIE Press 2006.
SLAVÍČEK, Pavel; ŠTĚPÁNOVÁ, Vlasta; KELAR, Jakub. Vakuová fyzika 1. 2016.
Practice of Advanced Nanostructure Preparation Technologies I
| Language of instruction | angličtina, čeština |
|---|---|
| Code | 653-3159 |
| Abbreviation | PPTPI |
| Course title | Practice of Advanced Nanostructure Preparation Technologies I |
| Coordinating department | Department of Materials Engineering and Recycling |
| Course coordinator | Ing. Zuzana Gelnárová, Ph.D. |
Summary
The main target of the advanced technology of nanostructure preparation is to obtain practical skills in the field thin film deposition using physical vapor deposition (PVD) and laser lithography. Students will use research laboratory equipment and setups.
Literature
Advised literature
LIN, B. J.: Optical Lithography, SPIE Press 2010.
ECKERTOVÁ, L.: Physics of Thin Films. Plenum Press, New York, 1986
FELDMAN, L. C., MAYER, J. W.: Fundamentals of Surface and Thin Film Analysis. Elsevier Science Publishing Co., Inc., 1986
ECKERTOVÁ, L.: Physics of Thin Films. Plenum Press, New York, 1986
FELDMAN, L. C., MAYER, J. W.: Fundamentals of Surface and Thin Film Analysis. Elsevier Science Publishing Co., Inc., 1986