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Practice of Advanced Nanostructure Preparation Technologies I

Type of study Follow-up Master
Language of instruction English
Code 653-3159/02
Abbreviation PPTPI
Course title Practice of Advanced Nanostructure Preparation Technologies I
Credits 3
Coordinating department Department of Materials Engineering and Recycling
Course coordinator Ing. Zuzana Gelnárová, Ph.D.

Subject syllabus

Laboratory training include preparation of thin films of dielectrics, semiconductors, and metals and master of lithographic processes. It is based on the particular items:
1. Preparation of thin films by physical vapor deposition processes (PVD) – including processes of magnetron sputtering and evaporation, control of vacuum system, and computer control of the processes
2. Lithographic process including preparation of photoresist using spin coating, input and exposition of the structure using laser lithograph, development and finalization of the lithographic process
3. Characterization of the prepared samples using ex-situ methods – ellipsometry, spectroscopy, optical microscopy, atomic force microscopy (AFM), electron microscopy

Literature

OHRING, M.: Materials Science of Thin Films. 2nd ed. San Diego: Academic Press, 2002.
BRODIE, I., MURAY, J. J.: The Physics of Micro/Nano-Fabrication. Plenum Press, New York, 1992;
VÁLYI, L.: Atom and Ion Sources. John Wiley and Sons Ltd (March 1, 1978);
MACK, C. A.: Field guide to optical lithography, SPIE Press 2006.
SLAVÍČEK, Pavel; ŠTĚPÁNOVÁ, Vlasta; KELAR, Jakub. Vakuová fyzika 1. 2016.

Advised literature

LIN, B. J.: Optical Lithography, SPIE Press 2010.
ECKERTOVÁ, L.: Physics of Thin Films. Plenum Press, New York, 1986
FELDMAN, L. C., MAYER, J. W.: Fundamentals of Surface and Thin Film Analysis. Elsevier Science Publishing Co., Inc., 1986