The main target of the course are methods of optical spectroscopy and
ellipsometry used for characterization of thin films, multilayers, periodic
systems, composites, and nanostructures. The course includes fundamentals of
optical spectroscopy and ellipsometry, measurement configurations, interaction
of light with metals, semiconductor, and dielectrics. Modeling of light
reflection and transmission from multilayers, periodic gratings, and composite
systems is completed by fitting of experimental data using optimization
techniques. Effects of anisotropy, surface roughness, depolarization, and
component imperfections are discussed. The course is mainly focused on
reflection and transmission spectroscopy in visible, near infrared and near
ultraviolet spectral range, spectroscopic ellipsometry, Fourier transform
infrared (FTIR) spectroscopy and magneto-optical spectroscopy.