| Course Unit Code | 637-0825/01 |
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| Number of ECTS Credits Allocated | 3 ECTS credits |
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| Type of Course Unit * | Choice-compulsory type B |
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| Level of Course Unit * | Second Cycle |
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| Year of Study * | Second Year |
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| Semester when the Course Unit is delivered | Summer Semester |
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| Mode of Delivery | Face-to-face |
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| Language of Instruction | Czech |
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| Prerequisites and Co-Requisites | Course succeeds to compulsory courses of previous semester |
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| Name of Lecturer(s) | Personal ID | Name |
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| DRA30 | prof. Ing. Jaromír Drápala, CSc. |
| Summary |
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| The subject is oriented on characteristic of processes for preparation of individual types of micro- and nano-structural materials and materials that are used by the existing technologies in relation to micro-technologies, used materials and directions of development for the needs of qualified solution of problems connected with continuing miniaturisation of electronic systems and elements. It deals also with technologies for preparation of physically and chemical highly pure materials, basic processes and materials of contemporary micro-technology of semi-conducting materials and integrated circuits with very high integration, impact of geometric dimensions on properties of solid materials, mechanisms of non-equilibrium processes of formation of micro- and nano-structure, principles of selectivity and procedures of technological operations, synthesis, forming of micro- and nano-layers, processing of bulk materials, their characterisation, properties and applications in electronics. Lectures on theory of synthesis of micro- and nano-materials, molecular engineering, micro-technologies give an idea about technologies of next decades. |
| Learning Outcomes of the Course Unit |
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Student after passing the exam from this subject will be able to:
- acquire an overview of prospective materials for microelectronics
- write up possibilities of individual technologies for production of materials for microelectronics |
| Course Contents |
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1. Basic characteristics and demands on micro - and nanoelectronics materials. Technology and preparation of physical and highly chemically pure materials. Physical, chemical and physico - chemical methods of the purification of metallic and non-metallic materials and their characterization.
2. Methods of the preparation of highly pure and structural defined materials with monocrystalline structure for new type of electronic, optoelectronic and magnetic components. Influence of electrically active elements on characteristics of the electronic parts.
3. Basic processes and materials. Contemporary semiconductor and integrated circuits technologies, general structure of technologies applied in microelectronics, evolution and kinds of technologies, preparation of substrates, photolithography, basic materials used at creation of textures in semiconductor elements.
4. Basic semiconductors and semiconductor compounds, dielectric nanolayers and methods their formation, metallic contacts and internal wiring, micro - doping, technological defects in semiconductor elements, principles check - up and automatization of technological processes.
5. Influence of geometric proportions on properties of solid materials. Properties of microcrystals and crystallization seeds, basic period of the formation of nanolayers and areas their using, dimensioned effects in structure of electronic elements
6. Miniaturization and topology of electronic elements, nanotechnology operation and functional characteristics of parts, mechanism of the degradation of electronic elements.
7. Mechanism of non-equilibrium processes of the formation of nanostructure. Classification of theoretic models of the crystallization, quasi - equilibrium and kinetic models, kinetic- statistic models of the creation of layers from molecular beam epitaxy, mechanism of the growth of nanolayers using chemical reaction (CVD, MO CVD, ).
8. Mechanism of basic processes of the growth of nanolayers, epitaxy, evaporation, sputtering and ionic implantation, diffusion in semiconductors.
9. Microelectronics. Principle of selectivity and procedure of microtechnology operations. Fundamental criteria of the classification of local operations, methods of formation of the starting topology figure on bed, masking, locally activated operation, topology conversion and generation of additional structure elements by the help of selective operations.
10. Generation horizontal classification structures. Lithographic methods. EUV lithography, electron and ionic configuring lithography. Reactive ionic etching. Formation of vertical microstructures. Epitaxial methods. Molecular beam epitaxy, epitaxy from metall-organic substances. Technology of the preparation of quantum points on the base of semiconductors.
11. Final operation, physical methods of check - up of defects, composition and circuits of local operations, fundamental conditions of the total removing of mechanical connections. LP CVD, LE CVD, PETEOS methods. Proposal of the micro-transistor, physical simulation.
12. Micro-optoelectronics, AIIIBV, AIIBVI …compounds. Materials for laser technique, radiation detectors, solar technique.
13. Magnetic and dielectric materials. Oxide materials for memory elements (ferrites, ferroelectrics), materials for bubble memories (garnets).
14. Liquid crystals. Nematic, lamellar and columnar systems - structure and its transformation, materials for special purposes, whiskers. |
| Recommended or Required Reading |
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| Required Reading: |
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WHITAKER, J.C.: Microelectronics. Second Edition. CRC Press, 2006.
BOUDA, V., HAMPL, J., LIPTÁK, J.: Materials for Electronics. University mimeographed, ČVUT Prague, 2000.
HARPER, Ch.A.: Electronic Materials and Processes Handbook. McGraw-Hill, 2004.
DORF, R.C.: The Electrical Engineering Handbook Series. Second Edition. CRC Press, 2005. |
DRÁPALA, J.: Materiály pro elektrotechniku. Studijní opora, VŠB - TU Ostrava, 2014, http://www.person.vsb.cz/archivcd/FMMI/ETMAT/
DORFMAN, V. F.: Mikrometallurgija v mikroelektronike. Moskva, Metallurgija, 272 s., 1978 |
| Recommended Reading: |
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| KLAUK HAGEN: Organic Electronics: Materials, Munufacturing and Applications. Willey-VCH, 2006. |
PAVLOV, L. P.: Metody izmerenija parametrov poluprovodniovych materialov, Moskva, Vysšaja škola, 240 s., 1987
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| Planned learning activities and teaching methods |
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| Lectures, Seminars, Individual consultations, Tutorials, Project work |
| Assesment methods and criteria |
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| Task Title | Task Type | Maximum Number of Points
(Act. for Subtasks) | Minimum Number of Points for Task Passing |
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| Exercises evaluation and Examination | Credit and Examination | 100 (100) | 51 |
| Exercises evaluation | Credit | 40 | 25 |
| Examination | Examination | 60 | 16 |