Course Unit Code | 9360-0159/01 |
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Number of ECTS Credits Allocated | 3 ECTS credits |
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Type of Course Unit * | Compulsory |
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Level of Course Unit * | Second Cycle |
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Year of Study * | Second Year |
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Semester when the Course Unit is delivered | Winter Semester |
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Mode of Delivery | Face-to-face |
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Language of Instruction | Czech |
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Prerequisites and Co-Requisites | Course succeeds to compulsory courses of previous semester |
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Name of Lecturer(s) | Personal ID | Name |
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| POS40 | doc. Dr. Mgr. Kamil Postava |
Summary |
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The main target of the advanced technology of nanostructure preparation is to obtain practical skills in the field thin film deposition using physical vapor deposition (PVD) and laser lithography. Students will use research laboratory equipment and setups. |
Learning Outcomes of the Course Unit |
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Course Contents |
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Laboratory training include preparation of thin films of dielectrics, semiconductors, and metals and master of lithographic processes. It is based on the particular items:
1. Preparation of thin films by physical vapor deposition processes (PVD) – including processes of magnetron sputtering and evaporation, control of vacuum system, and computer control of the processes
2. Lithographic process including preparation of photoresist using spin coating, input and exposition of the structure using laser lithograph, development and finalization of the lithographic process
3. Characterization of the prepared samples using ex-situ methods – ellipsometry, spectroscopy, optical microscopy, atomic force microscopy (AFM), electron microscopy |
Recommended or Required Reading |
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Required Reading: |
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OHRING, M.: Materials Science of Thin Films. 2nd ed. San Diego: Academic Press, 2002.
BRODIE, I., MURAY, J. J.: The Physics of Micro/Nano-Fabrication. Plenum Press, New York, 1992;
VÁLYI, L.: Atom and Ion Sources. John Wiley and Sons Ltd (March 1, 1978);
MACK, C. A.: Field guide to optical lithography, SPIE Press 2006. |
OHRING, M.: Materials Science of Thin Films. 2nd ed. San Diego: Academic Press, 2002.
BRODIE, I., MURAY, J. J.: The Physics of Micro/Nano-Fabrication. Plenum Press, New York, 1992;
VÁLYI, L.: Atom and Ion Sources. John Wiley and Sons Ltd (March 1, 1978);
MACK, C. A.: Field guide to optical lithography, SPIE Press 2006.
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Recommended Reading: |
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LIN, B. J.: Optical Lithography, SPIE Press 2010.
ECKERTOVÁ, L.: Physics of Thin Films. Plenum Press, New York, 1986
FELDMAN, L. C., MAYER, J. W.: Fundamentals of Surface and Thin Film Analysis. Elsevier Science Publishing Co., Inc., 1986 |
LIN, B. J.: Optical Lithography, SPIE Press 2010.
ECKERTOVÁ, L.: Physics of Thin Films. Plenum Press, New York, 1986
FELDMAN, L. C., MAYER, J. W.: Fundamentals of Surface and Thin Film Analysis. Elsevier Science Publishing Co., Inc., 1986 |
Planned learning activities and teaching methods |
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Seminars, Tutorials |
Assesment methods and criteria |
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Task Title | Task Type | Maximum Number of Points (Act. for Subtasks) | Minimum Number of Points for Task Passing |
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Graded credit | Graded credit | 100 | 51 |